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Photomask guide Table of Contents Contents What is a Photo-Mask How are Photo-Masks Made Where are Photo-Masks Used How are Photo-Masks Used The Material Substrates Glass Speci ?cations Chrome Speci ?cations Polyester Speci ?cations Write Areas Tolerances

Table of Contents Contents What is a Photo-Mask How are Photo-Masks Made Where are Photo-Masks Used How are Photo-Masks Used The Material Substrates Glass Speci ?cations Chrome Speci ?cations Polyester Speci ?cations Write Areas Tolerances Resolutions Resolutions Feature Tolerances Dimensional Tolerances Capabilities Equipment Speci ?cations Designing Your Mask Design Rules Composite Layers Choosing Formats Fixing Drawing Errors Dimensional Stability Dimensional Factors Irreversible dimensional changes Acclimatisation of masks before use Main Points CQuality Control PRE Veri ?cation Inspection POST Veri ?cation Inspection Defects Ordering Your Mask Steps to Ordering The Order Form Terminology Other factors Orders Payment Handling Cleaning Storage Handling the mask Cleaning the masks Storage of the masks Other services and products Photo-Tooling Large Format Tooling Scanning Reverse Engineering CAD Data Preparation CAD Conversions Company Structure Contacts Details Environmental Policy Privacy Policy Returns Policy Glossary Quick Reference Revision ?? Dec Revision ?? April Revision ?? March Revision ?? Sept Revision ?? Oct CTHE PHOTO -MASK GUIDE JD Photo-Tools Page of CTHE PHOTO -MASK GUIDE Chapter What is a Photo-Mask A simple overview on what photo-masks are ?? how they are made and how they are used A photo-mask is an opaque plate or ?lm with transparent areas that allow light to shine through in a de ?ned pattern They are commonly used in photolithography processes but are also used in many other applications by a wide range of industries and technologies They are made on Soda Lime glass on Fused Silica Quartz and even on polyester ?lm The mask acts as a template and is designed to optically transfer patterns to wafers or other substrates in order to fabricate devices of all types Current lithographic tools project light through a photomask and a high aperture lens The intensity of the light casts an image of the device's design the pattern on the photomask onto a substrate such as a silicon wafer coated with a light sensitive material called photoresist Using negative photoresist the unexposed or masked portion of this material is then removed so it can either be etched to form channels or be deposited with other materials The process is reversed using positive photoresist Photomasks requiring sophisticated manufacturing techniques and complex mathematical algorithms to design are at the forefront of the microminiaturization of chips enabling more functionality to be embedded within a smaller area This trend in making devices as powerful and as small as possible facilitates the proliferation of handheld and other portable electronic applications Photomasks have always been a necessary component in the Micro Manufacturing process There are three types of base material used to make photo-masks Soda Lime SL Quartz and polyester ?lm Soda Lime is the most common material for photo-masks and typical glass mask sizes SL and Quartz can range from inches square to inches square but even ? square and ? square are produced in our production facilities The thickness of the plates ranges from mils to mils depending upon the size of the plate being imaged Currently the most common sizes